Microstructure and magnetic properties of FeCoHfN thin films deposited by DC reactive sputtering

Tianyuan Li,Xiyang Liu,Jiawei Li,Lining Pan,Aina He,Yaqiang Dong

DOI: https://doi.org/10.1016/j.jmmm.2021.168777

IF: 3.097

2022-04-01

Journal of Magnetism and Magnetic Materials

Abstract:The microstructure and electro-magnetic properties of FeCoHfN thin films deposited by reactive sputtering under an in-situ magnetic field have been studied as a function of nitrogen partial pressure (R(N2)). As the (R(N2)) increases, the grain size of α-FeCo phase can be effectively reduced, and the structure of the films changes from an amorphous/nanocrystalline dual-phase structure with ultrafine α-FeCo magnetic nanoparticles isolated by a nonmagnetic insulating layer to a single amorphous structure. The structural transformation and the enrichment of HfN layer improve the resistivity and static and dynamic soft magnetic properties of the films. Higher resistivity is expected to reduce eddy current losses at high frequencies. The critical (R(N2)) when the film shows indications of excellent high-frequency magnetic properties is 8%. The deposited FeCoHfN thin films have high saturation magnetization of 14.9–16.2 kGs, great permeability of 222–322 at GHz, and high ferromagnetic resonance frequency up to 3.5 GHz, showing the promise of high-frequency applications.

materials science, multidisciplinary,physics, condensed matter