High-Performance Flexible Single-Crystalline Silicon Nanomembrane Thin-Film Transistors with High-k Nb2O5-Bi2O3-MgO Ceramics As Gate Dielectric on a Plastic Substrate

Kuibo Lan
DOI: https://doi.org/10.1021/acsami.8b00470
IF: 9.5
2018-01-01
ACS Applied Materials & Interfaces
Abstract:A novel method of fabricating flexible thin-film transistor based on single crystalline Si nanomembrane (SiNM) with high-k Nb2O5-Bi2O3-MgO (BMN) ceramic gate dielectric on a plastic substrate is demonstrated in this paper. SiNMs are successfully transferred to a flexible polyethylene terephthalate substrate, which has been plated with indium-tin-oxide (ITO) conductive layer and high-k BMN ceramic gate dielectric layer by room-temperature magnetron sputtering. The BMN ceramic gate dielectric layer demonstrates as high as similar to 109 dielectric constant, with only dozens of pA current leakage. The Si-BMN-ITO heterostructure has only similar to nA leakage current at the applied voltage of 3 V. The transistor is shown to work at a high current on/off ratio of above 10(4), and the threshold voltage is similar to 1.3 V, with over 200 cm(2)/(V s) effective channel electron mobility. Bending tests have been conducted and show that the flexible transistors have good tolerance on mechanical bending strains. These characteristics indicate that the flexible single-crystalline SiNM transistors with BMN ceramics as gate dielectric have great potential for applications in high-performance integrated flexible circuit.
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