Gate-tunable strong-weak localization transition in few-layer black phosphorus.

Gen Long,Shuigang Xu,Xiangbin Cai,Zefei Wu,Tianyi Han,Jiangxiazi Lin,Chun Cheng,Yuan Cai,Xinran Wang,Ning Wang
DOI: https://doi.org/10.1088/1361-6528/aa9bc1
IF: 3.5
2018-01-01
Nanotechnology
Abstract:Atomically-thin black phosphorus (BP) field-effect transistors show strong-weak localization transition, which is tunable through gate voltages. Hopping transports through charge impurityinduced localized states are observed at low carrier density regime. Variable-range hopping model is applied to simulate scattering behaviors of charge carriers. In the high carrier concentration regime, a negative magnetoresistance indicates weak localization effects. The extracted phase coherence length is power-law temperature-dependent (similar to T-0.48 +/- 0.03) and demonstrates inelastic electron-electron interactions and the 2D transport features in few-layer BP field-effect devices. The competition between localization and phase coherence lengths is investigated and analyzed based on observed gate-tunable strong-weak localization transition in few-layer BP. Supplementary material for this article is available online
What problem does this paper attempt to address?