Abstract:The surface diffusion of Cu adatoms in the presence of an adisland at FCC or HCP sites on Cu(111) is studied using the EAM potential derived by Mishin {\it et al.} [Phys. Rev. B {\bf 63} 224106 (2001)]. The diffusion rates along straight (with close-packed edges) steps with (100) and (111)-type microfacets (resp. step A and step B) are first investigated using the transition state theory in the harmonic approximation. It is found that the classical limit beyond which the diffusion rates follow an Arrhenius law is reached above the Debye temperature. The Vineyard attempt frequencies and the (static) energy barriers are reported. Then a comparison is made with the results of more realistic classical molecular dynamic simulations which also exhibit an Arrhenius-like behavior. It is concluded that the corresponding energy barriers are completely consistent with the static ones within the statistical errors and that the diffusion barrier along step B is significantly larger than along step A. In contrast the prefactors are very different from the Vineyard frequencies. They increase with the static energy barrier in agreement with the Meyer-Neldel compensation rule and this increase is well approximated by the law proposed by Boisvert {\it et al.} [Phys. Rev. Lett. {\bf 75} 469 (1995)]. As a consequence, the remaining part of this work is devoted to the determination of static energy barriers for a large number of diffusion events that can occur in the presence of an adisland. In particular, it is found that the corner crossing diffusion process for triangular adislands is markedly different for the two types of borders (A or B). From this set of results the diffusion rates of the most important atomic displacements can be predicted and used as input in Kinetic Monte-Carlo simulations.

Diffusion boundary condition at surface steps

Diffusion on a stepped substrate

The Effect of Step Thickness on the Surface Diffusion of A Pt Adatom

Apparent anomalous prefactor enhancement for surface diffusion due to surface defects

Diffusion of Ellipsoidal Granular Particles in Shear Flow

Step Effects on Surface Diffusion:

Diffusion processes and growth on stepped metal surfaces

Chapter 4 Dynamics and Diffusion of Atoms at Stepped Surfaces

Effects Of Lattice Steps In Surface Diffusion And Epitaxial Growth

Experimental study of surface diffusion rate enhancement along steps: CO on Pt(111)

Finite-element simulation of the diffusive growth of grain boundary voids

Diffusion rates of Cu adatoms on Cu(111) in the presence of an adisland nucleated at FCC or HCP sites

Permeability and kinetic coefficients for mesoscale BCF surface step dynamics: discrete 2D deposition-diffusion equation analysis

Burton-Cabrera-Frank theory for surfaces with alternating step types

Boundary Conditions in Diffusional Growth and Sedimentation

Surface Self-Diffusion of Adatom on Pt Cluster with Truncated Octahedron Structure

Diffusion-Dependent Pattern Formation on Crystal Surfaces

MOLECULAR DYNAMICS SIMULATIONS OF SINGLE Si ADATOM DIFFUSION ON THE Si(001) SURFACE AND ACROSS SINGLE-LAYER Si(001) STEPS

Coupled Grain Boundary and Surface Diffusion in A Polycrystalline Thin Film Constrained by Substrate

Confined Subdiffusion in Three Dimensions

Improved Exponential Discretization Method for Convection-Diffusion Equation