Abstract:The surface diffusion of Cu adatoms in the presence of an adisland at FCC or HCP sites on Cu(111) is studied using the EAM potential derived by Mishin {\it et al.} [Phys. Rev. B {\bf 63} 224106 (2001)]. The diffusion rates along straight (with close-packed edges) steps with (100) and (111)-type microfacets (resp. step A and step B) are first investigated using the transition state theory in the harmonic approximation. It is found that the classical limit beyond which the diffusion rates follow an Arrhenius law is reached above the Debye temperature. The Vineyard attempt frequencies and the (static) energy barriers are reported. Then a comparison is made with the results of more realistic classical molecular dynamic simulations which also exhibit an Arrhenius-like behavior. It is concluded that the corresponding energy barriers are completely consistent with the static ones within the statistical errors and that the diffusion barrier along step B is significantly larger than along step A. In contrast the prefactors are very different from the Vineyard frequencies. They increase with the static energy barrier in agreement with the Meyer-Neldel compensation rule and this increase is well approximated by the law proposed by Boisvert {\it et al.} [Phys. Rev. Lett. {\bf 75} 469 (1995)]. As a consequence, the remaining part of this work is devoted to the determination of static energy barriers for a large number of diffusion events that can occur in the presence of an adisland. In particular, it is found that the corner crossing diffusion process for triangular adislands is markedly different for the two types of borders (A or B). From this set of results the diffusion rates of the most important atomic displacements can be predicted and used as input in Kinetic Monte-Carlo simulations.

Diffusion processes and growth on stepped metal surfaces

Exchange Mechanism for Adatom Diffusion on Metal Fcc(100) Surfaces

Diffusion on a stepped substrate

Chapter 4 Dynamics and Diffusion of Atoms at Stepped Surfaces

ATOMIC LEVEL STUDIES OF THE DYNAMICS AND DYNAMICAL BEHAVIOR OF SOLID SURFACES

Mechanisms for adatoms diffusing on metal fcc(111) surfaces

Diffusion-Dependent Pattern Formation on Crystal Surfaces

Effects Of Lattice Steps In Surface Diffusion And Epitaxial Growth

Simulation of Dimer Diffusion on Metal Fcc (001) Surfaces by Molecular Dynamics

Global Study of Mechanisms for Adatom Diffusion on Metal Fcc(100) Surfaces

Complex-Temperature Properties of the Ising Model on 2D Heteropolygonal Lattices

Ab initio study of step formation and self-diffusion on Ag(100)

Theoretical Study Of Adatom Self-Diffusion On Metallic Fcc {001} Surfaces

Systematical Study of Dimer Diffusion on Metal Fcc(001) Surfaces

Adatom Self-Diffusion on Pt (100) Surface by an Ad-Dimer Migrating

Local Quantum Dot Tuning on Photonic Crystal Chips

Diffusion Controlled Growth of Metallic Nanoclusters at Selected Surface Sites

Diffusion rates of Cu adatoms on Cu(111) in the presence of an adisland nucleated at FCC or HCP sites

Diffusions of small clusters on Pt(111) and Cu(111) surfaces

Burton-Cabrera-Frank theory for surfaces with alternating step types

Self-Diffusion Mechanisms of Adatom on Al (001), (011) and (111) Surfaces