Thermoelectric La-doped SrTiO3 epitaxial layers with single-crystal quality: from nanometer to micrometer and mosaicity effects
M. Apreutesei,R. Debord,M. Bouras,P. Regreny,C. Botella,A. Benamrouche,A. Carretero-Genevrier,J. Gazquez,G. Grenet,S. Pailhes,G. Saint-Girons,R. Bachelet
DOI: https://doi.org/10.1080/14686996.2017.1336055
2017-03-28
Abstract:High-quality thermoelectric LaxSr1-xTiO3 (LSTO) layers (here with x = 0.2), with thicknesses ranging from 20 nm to 700 nm, have been epitaxially grown on SrTiO3(001) substrates by enhanced solid-source oxide molecular-beam epitaxy. All films are atomically flat (with rms roughness < 0.2 nm), with low mosaicity (<0.1°), and present very low electrical resistivity (<5 x 10-4 <a class="link-external link-http" href="http://ohm.cm" rel="external noopener nofollow">this http URL</a> at room temperature), one order of magnitude lower than commercial Nb-doped SrTiO3 single-crystalline substrate. The conservation of transport properties within this thickness range has been confirmed by thermoelectric measurements where Seebeck coefficients of around -60 microV/K have been found for all films, accordingly. Finally, a correlation is given between the mosaicity and the (thermo)electric properties. These functional LSTO films can be integrated on Si in opto-microelectronic devices as transparent conductor, thermoelectric elements or in non-volatile memory structures.
Materials Science