The Effect of N2 Gas Pressure During the Rapid Thermal Process on the Structural and Morphological Properties of Cigs Films

Xiaolong Zhu,Yaoming Wang,Aimin Li,Lei Zhang,Fuqiang Huang
DOI: https://doi.org/10.4028/www.scientific.net/amr.463-464.614
2012-01-01
Advanced Materials Research
Abstract:The effect of N2 gas pressure during the rapid thermal process (RTP) on the structural and morphological properties of CIGS films was investigated. The precursor was prepared by sputtering from a single quaternary CIGS target. XRD characterization demonstrated that there were two phase of CuIn0.7 Ga0.3 Se2 and Ga-rich CuInSubscript text1-xGaxSeSubscript text2 chalcopyrite structure in all of the selenized CIGS films. Too low and too high N2 gas pressure induced compact but small grain-size morphologies due to the insufficient Se supply. Furthermore, all of the samples exhibited delaminated cross-sectional morphologies. Finally, Photovoltaic devices prepared from absorbers selenized under 4 Torr N2 gas pressure resulted in efficiency of 4.8%.
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