The Structure and Magnetic Properties of Nizn-Ferrite Films Deposited by Magnetron Sputtering at Room Temperature

S. J. Nie,H. Geng,J. B. Wang,L. S. Wang,Z. W. Wang,R. Xu,G. H. Yue,Y. Chen,D. L. Peng
DOI: https://doi.org/10.4028/www.scientific.net/amr.690-693.1702
2013-01-01
Abstract:NiZn-ferrite thin films were deposited onto silicon and glass substrates by radio frequency magnetron sputtering at room temperature. The effects of the relative oxygen flow ratio on the structure and magnetic properties of the thin films were investigated. The study results reveal that the films deposited under higher relative oxygen flow ratio show a better crystallinity. Static magnetic measurement results indicated that the saturation magnetization of the films was greatly affected by the crystallinity, grain dimension, and cation distribution in the NiZn-ferrite films. The NiZn-ferrite thin films with a maximum saturation magnetization of 151 emu.cm(-3), which is about 40% of the bulk NiZn ferrite, was obtained under relative oxygen flow ratio of 60%.
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