Abstract:Nickel (II) Oxide (NiO) is an emerging transparent semiconducting oxide with potential application in modern world ultraviolet active solar cells and visible-blind photodetectors. Despite of their critical importance, synthesis of device quality NiO thin films has remained a challenging issue. Inadequate research on growth kinetics leads to poor understanding of underlying science behind the modifications in the material properties of the grown films. Therefore, the present article reports an analysis of temperature-driven perturbations in the growth kinetics associated properties of NiO thin films grown via radio-frequency sputtering technique. The structural, morphological and optical properties of NiO films growth at various temperatures were probed and the obtained results were correlated thoroughly. It was observed that variation in growth temperature (30 – 500oC) alters the growth mechanism (Volmer-Weber to Stranski-Krastanov), surface features, stoichiometry, crystallite size, stress/strain as well as dislocation densities. The increment in Urbach energy at elevated temperatures indicated that the thermal excitation induced high adatoms mobility leading to poor crystallinity and high disorder. Interestingly, it was witnessed that NiO films growth at temperatures > 300oC exhibited stress relaxation via generation of higher defect states, lower surface roughness due to increased adatoms mobility and the suppression of first order Raman vibrational states (1PLO) associated with Ni-vacancies. Hence, we conclude that NiO films grown at 200 & 300oC possess superior material properties viz. largest crystallite size (∽ 20 nm), lower defects and high transmittance (> 90%) for device related applications.This article is protected by copyright. All rights reserved.

Temperature-dependence of Magnetron Sputtered NiFe Films: Structure, Morphology, Optical, Electrical and OER Catalytic Properties

Structure, Electrical, Optical and Magnetoelectric Properties of Magnetron Sputtered Nanocrystalline NiFe/BaTiO3 Thin Films

Magnetic And Electric Properties Of Fe3o4 Thin Films Sputtered On Metallic Underlayer

Physical characteristics and cation distribution of NiFe2O4 thin films with high resistivity prepared by reactive co-sputtering

Electrical transport and optical band gap of NiFe$_\textrm{2}$O$_\textrm{x}$ thin films

Tunable Electrical Properties of NiO Thin Films and P-Type Thin-Film Transistors

Growth Temperature Dependent Evolutions of Microstructural, Optical and Magnetic Properties of Zn0.75Co0.25O Films

Properties of the Highly Textured (200) NiO Thin Film Deposited by RF Magnetron Sputtering

Annealing Temperature Dependent Ferromagnetic Behaviors Observed in Highly Orientated Pure NiO Thin Films

Effect of sputtering pressure and oxygen content on the electrochromic properties of NiO films by DC magnetron sputtering

Annealing Temperature Effect on the Physical Properties of NiO Thin Films Grown by DC Magnetron Sputtering (Adv. Mater. Interfaces 9/2024)

Thermal, structural and optical properties of NiOx thin films deposited by reactive dc-magnetron sputtering

Substrate Temperature Effect on Growth Behavior and Microstructure-Properties Relationship in Amorphous Ni-Nb Thin Films

Temperature‐Driven Perturbations in Growth Kinetics, Structural and Optical Properties of NiO Thin Films

Magnetization Switching Dynamics of Electrodeposited Fe–Ni Thin Films

Sputtering Power Induced Physical Property Variation of Nickel Oxide Films by Radio Frequency Magnetron Sputtering

Characterizations of Nickel Oxide Thin Films Prepared by Reactive Radio Frequency Magnetron Sputtering

Magnetic Properties of Sputtered Fe1−xO and Fe+Fe3O4 Thin Films

Thickness Dependence of Room Temperature Ferromagnetism Observed in Fe-doped NiO Thin Films

Direct and Alternating Current Magnetic Properties of FeNi Particles Coated with SiO2

Influence of oxygen flow rate and annealing temperature on composition, microstructure and mechanical properties of Fe–O films by reactive magnetron sputtering