Abstract:Our present work is devoted to analyzing the influence of Ni on the optical properties of ZnO thin films deposited on glass and Si (100) substrates, with the use of ALD for ZnO deposition and DC magnetron sputtering for Ni interlayer deposition. The compositions as well as the crystalline structure of various multilayer thicknesses of Ni (10, 30, 50, and 70 nm), that sandwiched between ZnO Films (70 nm), before being optically characterized, were carried out by the X-ray diffraction (XRD) Based on the XRD results, the crystallite size was increased with the increase of the Ni interlayer concentration. Additionally, the material densities for both ZnO and Ni show the expected close-to-bulk values in all formations, where the large cavities between atoms, on the films make the dislocation density become smaller and the surface roughness values decrease as well, with the increase of Ni interlayer concentration. Different optical properties were observed for different Ni content. The optical absorption coefficient (α), refractive index ( n ), and extinction coefficient ( k ) have been deduced from the transmission T(λ) and absorption measurements A(λ). The optical energy gap Egopt are estimated from Tauc ́s extrapolation procedure and the Kubelka-Munk approach. The static refractive index ( n o ), the oscillator energy ( E o ), and the dispersion energy ( E d ) are calculated using the Wemple-DiDomenico (WDD) theoretical model. Analysis of third-order nonlinear optical properties in crystalline ZnO/Ni/ZnO are being detailed. These promising results imply that the high-quality films produced by ALD, show how the insertion of Ni could enhance the quality of the optical properties of ZnO films.

Electrical and Magnetic Properties of ZnNiO Thin Films Deposited by Pulse Laser Deposition

Effect of Nucleation and Growth Kinetics on the Electrical and Optical Properties of Undoped ZnO Films

Structural and Magnetic Properties of Ni1-x FexO Thin Films Synthesized by Pulsed Laser Deposition

Structural and magnetic properties of Ni1-xFexO thin films synthesized by pulsed laser deposition

The Effects of Ni–Na Codoping on Structure and Properties of ZnO Films by Pulsed Laser Deposition

Properties of Ni doped and Ni–Ga co-doped ZnO thin films prepared by pulsed laser deposition

Doping concentration dependence of room-temperature ferromagnetism for Ni-doped ZnO thin films prepared by pulsed-laser deposition

Properties of the Highly Textured (200) NiO Thin Film Deposited by RF Magnetron Sputtering

Peculiarities of Electric and Dielectric Behavior of Ni- or Fe-Doped ZnO Thin Films Deposited by Atomic Layer Deposition

Effect of Oxygen Pressure on Structural and Electrical Properties of Pulsed Laser Deposition-Derived Zn0.95mg0.05o: Li Thin Films

High‐Quality NiFe Thin Films on Oxide/Non‐Oxide Platforms via Pulsed Laser Deposition at Room Temperature

Fabrication of P-Type ZnMgO Films Via Pulsed Laser Deposition Method by Using Li As Dopant Source

Room Temperature Ferromagnetism of Ni, (ni, Li), (ni, N)-doped ZnO Thin Films

Properties of Zn1-xCoxO thin films grown on silicon substrates prepared by pulsed laser deposition

EXAFS and XANES investigation of (Li, Ni) codoped ZnO thin films grown by pulsed laser deposition

High-quality NiFe thin films on oxide/non-oxide platforms via pulsed laser deposition at room temperature

Fabrication of P-Type Li-Doped Zno Films by Pulsed Laser Deposition

Fabrication and magnetic properties of co-doped ZnO thin films by pulsed laser deposition

Linearization and characterization of the Wemple – DiDomenico model of ZnO/Ni/ZnO tri-layer thin films prepared by ALD and DC magnetron sputtering

Characterizations of Nickel Oxide Thin Films Prepared by Reactive Radio Frequency Magnetron Sputtering

Fabrication and Properties of Li-doped ZnCoO Diluted Magnetic Semiconductor Thin Films