Growth and Etching of Monolayer Hexagonal Boron Nitride

lifeng wang,bin wu,lili jiang,jisi chen,yongtao li,wei guo,pingan hu,yunqi liu
DOI: https://doi.org/10.1002/adma.201501166
IF: 29.4
2015-01-01
Advanced Materials
Abstract:The full spectrum from attachment-kinetic-dominated to diffusion-controlled modes is revealed for the cases of monolayer h-BN chemical vapor deposition (CVD) growth and Ar/H-2 etching. The sets of grown and etched structures exhibit well-defined shape evolution from Euclidian to fractal geometry. The detailed abnormal processes for merging h-BN flakes into continuous structures or film are first observed and explained.
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