Nanotribological Behavior of Ultra-thin Al 2 O 3 Films Prepared by Atomic Layer Deposition

Zhimin Chai,Yuhong Liu,Xinchun Lu,Dannong He
DOI: https://doi.org/10.1007/s11249-014-0341-0
2014-01-01
Tribology Letters
Abstract:Si-based nano/micro-electromechanical system (NEMS/MEMS) devices with contacting and rubbing structures cannot run reliably due to their poor tribological performance. A thin alumina (Al 2 O 3 ) film is a promising candidate for the protective coating in the applications of NEMS/MEMS devices. In this study, nanotribological behavior of ultra-thin Al 2 O 3 films prepared by atomic layer deposition on a Si (100) substrate was investigated in comparison with that of Si (100). X-ray photoelectron spectroscopy was used to determine the composition of Al 2 O 3 films. Atomic force microscopy with different tips was employed to measure the scratch resistance, adhesion and friction forces of various samples. The results show that Al 2 O 3 films have larger scratch resistance than that of Si (100). In addition, the adhesion and friction forces of Al 2 O 3 films are smaller than that of Si (100). Thus, the Al 2 O 3 films are capable of a wide application in Si-based NEMS/MEMS devices. The improved tribological performance of Al 2 O 3 films is attributed to their hydrophobic properties.
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