Investigation on microtribological behavior of thin films using friction force microscopy

Xin-Chun Lu,Bing Shi,Lawrence K.Y Li,Jianbin Luo,Jihui Wang,Hengde Li
DOI: https://doi.org/10.1016/S0257-8972(00)00602-2
IF: 4.865
2000-01-01
Surface and Coatings Technology
Abstract:A purpose-built atomic force and friction force microscope (AFM/FFM) was employed to study micro friction and wear behavior of thin films of Langmiur–Blodgett (L–B), gold (Au), polytetrafluoroethylene (PTFE), silicon nitride (Si3N4) and PTFE/Si3N4 multi-layers prepared by different deposition techniques. The results show that the L–B film has a low friction coefficient but can be worn easily under a light load less than 20 nN; Au film and silicon wafer has a higher friction coefficient than that of L–B film and can be worn under a higher load of approximately 50 nN; the PTFE/Si3N4 multilayer has a lower friction coefficient than that of Si3N4 and has a higher micro wear resistance than that of PTFE. The friction force of the PTFE/Si3N4 multilayer is linear with the load at the nanometer scale. The worn track is formed in PTFE film and PTFE/Si3N4 multilayers when the load is greater than 70 nN.
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