Influence of N-doping on the Thermal Stability and Switching Speed of Zn15Sb85 Phase Change Material

Xiaoqin Zhu,Yifeng Hu,Hua Zou,Yongxing Sui,Jianzhong Xue,Dahua Shen,Jianhao Zhang,Sannian Song,Zhitang Song,Shunping Sun
DOI: https://doi.org/10.1007/s10854-014-2527-5
2014-01-01
Journal of Materials Science Materials in Electronics
Abstract:The phase change characteristics of nitrogen doping Zn 15 Sb 85 thin films were investigated by in situ film resistance measurements. The crystallization temperature and activation energy for crystallization of thin films increased with the increase of nitrogen doping concentration. Compared with Zn 15 Sb 85 , nitrogen doping Zn 15 Sb 85 thin films exhibited higher crystalline resistance, which is beneficial for the reduction of writing current of phase change memory. The analysis of X-ray diffractomer indicates that the films with doping of nitrogen can refine the grain size. A smaller density change before and after phase change for N-doped Zn 15 Sb 85 thin films was obtained from X-ray reflectivity. The phase transition speed between the amorphous and crystalline state was investigated by the picosecond laser pulses.
What problem does this paper attempt to address?