The fabrication and properties of N-doped Sb2Te3 phase-change materials prepared by pulsed laser deposition

Chen-Chen QIU,Xin ZHANG,Qian-Fei ZHOU,Xiao-Jing WU
DOI: https://doi.org/10.7693/wl20131207
2013-01-01
Physics
Abstract:Although Sb2Te3 (ST) has the merits of fast crystallization speed and low crystalli-zation temperature (132oC), it cannot be directly used in phase change random access memories due to its high reset voltage. In this study, N-doped ST thin films with different nitrogen concentrations were deposited by pulsed laser deposition (PLD). Atomic force microscopy showed that the surface rough-ness of as-grown and N-doped ST thin films was 0.12 nm and 0.58 nm, respectively. The N-doped films possesed better component stability, with significantly higher resistivity in the low resistance state and so lower reset voltages. The optimum set and reset voltages were obtained for films with a ni-trogen concentration of 6 at%, resulting in lower power consumption and good overall performance.
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