Abstract:Simple and efficient nanofabrication technology with low cost and high flexibility is indispensable for fundamental nanoscale research and prototyping. Lithography in the near field using the surface plasmon polariton (i.e., plasmonic lithography) provides a promising solution. The system with high stiffness passive nanogap control strategy on a high-speed rotating substrate is one of the most attractive high-throughput methods. However, a smaller and steadier plasmonic nanogap, new scheme of plasmonic lens, and parallel processing should be explored to achieve a new generation high resolution and reliable efficient nanofabrication. Herein, a parallel plasmonic direct-writing nanolithography system is established in which a novel plasmonic flying head is systematically designed to achieve around 15 nm minimum flying-height with high parallelism at the rotating speed of 8–18 m·s−1. A multi-stage metasurface-based polarization insensitive plasmonic lens is proposed to couple more power and realize a more confined spot compared with conventional plasmonic lenses. Parallel lithography of the nanostructures with the smallest (around 26 nm) linewidth is obtained with the prototyping system. The proposed system holds great potential for high-freedom nanofabrication with low cost, such as planar optical elements and nano-electromechanical systems.

Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography

Plasmonic Interference Lithography by Coupling the Bulk Plasmon Polariton Mode and the Waveguide Mode

Plasmonic Interference Lithography Based on the Second-Order Diffracted Wave of Grating and Hyperbolic Multilayer Graphene

Pushing the feature size down to 11 nm by interference photolithography with hyperbolic metamaterials under conventional UV light source

Plasmonic Lithography Utilizing Epsilon Near Zero Hyperbolic Metamaterial

Interference Photolithography with Metamaterials

Sub-diffraction-limited Interference Photolithography with Metamaterials

High-Speed Parallel Plasmonic Direct-Writing Nanolithography Using Metasurface-Based Plasmonic Lens

High Depth-of-Field Nanostructures by Rotational Near-Field Photolithography

248 Nm Imaging Photolithography Assisted by Surface Plasmon Polariton Interference

Sub-wavelength patterned pulse laser lithography for efficient fabrication of large-area metasurfaces

Two-Surface-Plasmon-Polariton-Absorption Based Nanolithography

Toward Practical, Subwavelength, Visible-Light Photolithography with Hyperlens.

Forty-Nanometer Plasmonic Lithography Resolution with Two-Stage Bowtie Lens

Two-Surface-Plasmon-Polariton-Absorption Based Lithography Using 400 Nm Femtosecond Laser

High-speed Near-Field Photolithography at 1685 Nm Linewidth with Linearly Polarized Illumination

Hyperbolic Spoof Plasmonic Metasurfaces

Realize the Concentric Circles Pattern Based on Two-Surface-Plasmon-Polariton Absorption Photolithography

Broad band focusing and demultiplexing of in-plane propagating surface plasmons.

Surface-plasmon-assisted nanoscale photolithography by polarized light

Hyperbolic spoof plasmons in layered equivalent graphene metasurfaces