Abstract:The concept of metamaterials offers a flexible pathway to manipulate the macroscopic behavior of light by delicately designed microscopic subwavelength structures, which has been recently introduced to integrated photonics to create devices with ultra-compact footprint, excellent performance or versatile functionalities. However, the conventional design approach of metamaterials, including two separated steps of subwavelength structure design and the assembly of unit cells, often encounters challenges when facing extreme design targets. In this work, we propose a hierarchical inverse design approach by cascading a conventional unit-cell-based design with a holistic topology optimization. As a proof-of-concept, we demonstrate ultra-short-range light focusing and mode-size conversion enabled by on-chip meta-lenses. The shortening of tapering region pushes higher numerical aperture of on-chip lenses, leading to the violation of locally periodic approximation used in meta-lens design and thus poor device performance, which fortunately, can be well compensated by the follow-up holistic optimization step. We experimentally realize mode-size squeezing by almost 20 times in a tapering region as short as 8 μm and 5 μm with low insertion loss and broadband performance. The proposed design scheme provides practical guidelines to design metamaterials as flexible on-chip wavefront control and light routing devices for various applications in fiber communication, sensing and optical computing.

Interference Photolithography with Metamaterials

Sub-diffraction-limited Interference Photolithography with Metamaterials

Single-color Peripheral Photoinhibition Lithography of Nanophotonic Structures

Light and Matter Co-Confined Multi-Photon Lithography

Photolithography Using Lateral Surface of Nanofibers

Pushing the feature size down to 11 nm by interference photolithography with hyperbolic metamaterials under conventional UV light source

Subwavelength Imaging with Composite Metamaterials

Plasmonic Interference Lithography by Coupling the Bulk Plasmon Polariton Mode and the Waveguide Mode

Toward Practical, Subwavelength, Visible-Light Photolithography with Hyperlens.

High Depth-of-Field Nanostructures by Rotational Near-Field Photolithography

Fractal Plasmonic Metamaterials for Subwavelength Imaging.

Direct Laser Writing Breaking Diffraction Barrier Based on Two-Focus Parallel Peripheral-Photoinhibition Lithography

Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography

Negative index metamaterial at ultraviolet range for subwavelength photolithography

Topologically-optimized On-Chip Metamaterials for Ultra-Short-range Light Focusing and Mode-Size Conversion

Superlens-enhanced Laser Interference Lithography

Physiochemical Coupled Dynamic Nanosphere Lithography Enabling Multiple Metastructures from Single Mask

Sub-wavelength patterned pulse laser lithography for efficient fabrication of large-area metasurfaces

248 Nm Imaging Photolithography Assisted by Surface Plasmon Polariton Interference

Plasmonic Lithography Utilizing Epsilon Near Zero Hyperbolic Metamaterial

Subwavelength Nanolithography Based on Unidirectional Excitation of Surface Plasmons