Abstract:This paper demonstrates a flexible and controllable fabrication of vertically aligned and high-aspect-ratio (HAR) micro-nano hierarchical structures using conventional micro-technologies. We first masked the nanopatterns on a photoresist mold by shifting the same photomask, which could be performed using conventional contact microlithography. Thereby replicating nanopatterns onto an aluminium mold and successfully fabricating silicon nanopillar arrays about 300 nm in diameter and 5 mu m in height via the deep reactive etching (DRIE) process. We also fabricated micro-nano hierarchical structures with variable aspect ratios using the proposed nanopattern technology and DRIE process without using any special nanopatterning equipment or techniques. The proposed method not only simplified the fabrication process but also produced HAR (higher than 15) structures. We also investigate the replica molding steps from the fabricated silicon stamp to a UV-curable polymer replica using a PDMS mold and conventional nano-imprinting, where each nanopillar diameter was 320 nm with 95% fidelity. As a result, the hierarchical structure arrays show stable superhydrophobic surface properties with a contact angle of approximately 160 degrees. Owing to the cost efficiency of mass production and the fidelity of the strategy, the methodology could provide a general approach for fabricating complex three-dimensional periodic hierarchical structures onto a single chip and can be applied to various fields of multifunctional applications.

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