A Simple Method to Synthesize Continuous Large Area Nitrogen-Doped Graphene

Hui Gao,Li Song,Wenhua Guo,Liang Huang,Dezheng Yang,Fangcong Wang,Yalu Zuo,Xiaolong Fan,Zheng Liu,Wei Gao,Robert Vajtai,Ken Hackenberg,Pulickel M. Ajayan
DOI: https://doi.org/10.1016/j.carbon.2012.05.026
IF: 10.9
2012-01-01
Carbon
Abstract:Large area nitrogen (N)-doped graphene films were grown on copper foil by chemical vapor deposition. The as-grown films consisted of a single atomic layer that was continuous across the copper surface steps and grain boundaries, and could be easily transferred to a variety of substrates. N-doping was confirmed by X-ray photoelectron spectroscopy, Raman spectroscopy, and elemental mapping. N atoms were suggested to mainly form a “pyrrolic” nitrogen structure, and the doping level of N reached up to 3.4at.%. The N-doped graphene exhibited an n-type behavior, and nitrogen doping would open a band gap in the graphene. This study presents use of a new liquid precursor to obtain large area, continuous and mostly single atom layer N-doped graphene films.
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