Theory and New Applications Ofex SituLift Out

Lucille A. Giannuzzi,Zhiyang Yu,Denise Yin,Martin P. Harmer,Qiang Xu,Noel S. Smith,Lisa Chan,Jon Hiller,Dustin Hess,Trevor Clark
DOI: https://doi.org/10.1017/s1431927615013720
IF: 4.0991
2015-01-01
Microscopy and Microanalysis
Abstract:The ex situ lift out (EXLO) adhesion forces are reviewed and new applications of EXLO for focused ion beam (FIB)-prepared specimens are described. EXLO is used to manipulate electron transparent specimens on microelectromechanical systems carrier devices designed for in situ electron microscope analysis. A new patented grid design without a support film is described for EXLO. This new slotted grid design provides a surface for holding the specimen in place and also allows for post lift out processing. Specimens may be easily manipulated into a backside orientation to reduce FIB curtaining artifacts with this slotted grid. Large EXLO specimens can be manipulated from Xe+ plasma FIB prepared specimens. Finally, applications of EXLO and manipulation of FIB specimens using a vacuum probe lift out method are shown. The vacuum probe provides more control for placing specimens on the new slotted grids and also allows for easy manipulation into a backside configuration.
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