Abstract:In this work, we proposed a novel High-Low-High Schottky barrier bidirectional tunnel field effect transistor (HLHSB-BTFET). Compared with previous technology which is named as High Schottky barrier BTFET (HSB-BTFET), the proposed HLHSB-BTFET requires only one gate electrode with independent power supply. More importantly, take an N type HLHSB-BTFET as an example, different from the previously proposed HSB-BTFET, due to that the effective potential of the central metal is increased with the increasing of drain to source voltage (Vds), built-in barrier heights maintain at the same value when the Vds is increased. Therefore, there is no strong dependence between built-in barrier heights formed in the semiconductor region on the drain side and the Vds. Besides that low Schottky barrier formed on the interface between the conduction band of silicon regions on its both sides and the central metal (while high Schottky barrier formed between the valence band of silicon regions on its both sides and the central metal) have been designed for preventing the carriers in valence band from flowing into the central metal induced by thermionic emission effect. Thereafter, the proposed N type HLHSB-BTFET has a natural blocking effect on the carriers flowing in valence band, and this blocking effect is not significantly degraded with the increasing of Vds, which is a huge promotion from the previous technology. The comparison between the two technologies is carried out, which exactly agrees with the design assumptions.

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