Abstract:Laser is recognized as one of the top technological achievements of 20th century and plays an important role in many fields, such as medicine, industry, entertainment and so on. Laser processing technology is one of the earliest and most developed applications of laser. With the rapid development of nanoscience and nanotechnology and micro/nano electronic devices, the micro/nanofabrication technologies become increasingly demanding in manufacturing industries. In order to realize low-cost, large-area and especially high-precision micro-nanofabrication, it has great scientific significance and application value to study and develop the laser fabrication technologies that can break the diffraction limit. In this article, the super resolution laser fabrication technologies are classified into two groups, far-filed laser direct writing technologies and near-field laser fabrication technologies. Firstly, the mechanisms and progress of several far-field laser direct writing technologies beyond the diffraction limit are summarized, which are attributed to the laser-matter nonlinear interaction. The super-diffraction laser ablation was achieved for the temperature-dependent reaction of materials with the Gaussian distribution laser, and the super-diffraction laser-induced oxidation in Metal-Transparent Metallic Oxide grayscale photomasks was realized by the laser-induced Cabrera-Mott oxidation process. Besides, the multi-photon polymerization techniques including degenerate/non-degenerate two-photon polymerization are introduced and the resolution beyond the diffraction limit was achieved based on the third-order nonlinear optical process. Moreover, the latest stimulated emission depletion technique used in the laser super-resolution fabrication is also introduced. Secondly, the mechanisms and recent advances of novel super diffraction near-field laser fabrication technologies based on the evanescent waves or surface plasmon polaritons are recommended. Scanning near-field lithography used a near-field scanning optical microscope coupled with a laser to create nanoscale structures with a resolution beyond 100 nm. Besides, near-field optical lithography beyond the diffraction limit could also be achieved through super resolution near-field structures, such as a bow-tie nanostructure. The interference by the surface plasmon polariton waves could lead to the fabrication of super diffraction interference fringe structures with a period smaller than 100 nm. Moreover, a femtosecond laser beam could also excite and interfere with surface plasmon polaritons to form laser-induced periodic surface structures. Furthermore, the super-resolution superlens and hyperlens imaging lithography are introduced. Evanescent waves could be amplified by using the superlens of metal film to improve the optical lithography resolution beyond the diffraction resolution. The unique anisotropic dispersion of hyperlens could provide the high wave vector component without the resonance relationship, which could also realize the super resolution imaging. Finally, prospective research and development tend of super diffraction laser fabrication technologies are presented. It is necessary to expand the range of materials which can be fabricated by laser beyond the diffraction limit, especially 2D materials.

Super-Resolution Nanofabrication with Metal-Ion Doped Hybrid Material Through an Optical Dual-Beam Approach

Single-color Peripheral Photoinhibition Lithography of Nanophotonic Structures

High-resolution 3D Nanoprinting Based on Two-Step Absorption Via an Integrated Fiber-Coupled Laser Diode.

Far-Field Super-Resolution Imaging Using Near-Field Illumination by Micro-Fiber

Superlens-enhanced Laser Interference Lithography

Nano-Structures Fabrication by Laser Combined with Near-Field Scanning Optical Microscopy

Highly efficient and controllable method to fabricate ultrafine metallic nanostructures

Laser nano-fabrication inside silicon with spatial beam modulation and non-local seeding

3D Nanolithography via Holographic Multi‐Focus Metalens

Super-regular femtosecond laser nanolithography based on dual-interface plasmons coupling

Femtosecond Laser Nano-Fabrication With Extended Processing Range

Photon Nanojet Lens: Design, Fabrication and Characterization

Generation and Formation of Gold Nanoparticles with Spatial Control by Two-Photon Femtosecond Laser Interference

The Mechanisms and Research Progress of Laser Fabrication Technologies Beyond Diffraction Limit

Two-Photon Photoreduction Of Metallic Nanoparticle Gratings In A Polymer Matrix

Direct And Subdiffraction-Limit Laser Nanofabrication In Silicon

Subdiffraction-limited milling by an optically driven single gold nanoparticle.

Ultrafast 3D nanofabrication via digital holography

Controllable Fabrication of Super-Resolution Nanocrater Arrays by Laser Direct Writing.

Fabrication of Micro/Nano Dual Needle Structures with Morphological Gradient Based on Two-Photon Polymerization Laser Direct Writing with Proactive Focus Compensation

Controllable fabrication of Sub-20nm structures with coupling field tip enhancement effect induced by nanosecond pulsed laser irradiation