Abstract:The prospect of employing nanophotonic methods for controlling photon–electron interactions has ignited substantial interest within the particle accelerator community. Silicon-based integrated dielectric laser acceleration (DLA) has emerged as a viable option by leveraging localized photonic effects to emit, accelerate, and measure electron bunches using exclusively light. Here, using highly regular nanopatterning over large areas while preserving the crystalline structure of silicon is imperative to enhance the efficiency and yield of photon-electron effects. While several established fabrication techniques may be used to produce the required silicon nanostructures, alternative techniques are beneficial to enhance scalability, simplicity and cost-efficiency. In this study, we demonstrate the nano-synthesis of silicon structures over arbitrarily large areas utilizing exclusively deep ultraviolet (DUV) ultrafast laser excitation. This approach delivers highly concentrated electromagnetic energy to the material, thus producing nanostructures with features well beyond the diffraction limit. At the core of our demonstration is the production of silicon laser-induced surface structures with an exceptionally high aspect-ratio -reaching a height of more than 100 nm- for a nanostructure periodicity of 250 nm. This result is attained by exploiting a positive feedback effect on the locally enhanced laser electric field as the surface morphology dynamically emerges, in combination with the material properties at DUV wavelengths. We also observe strong nanopattern hybridization yielding intricate 2D structural features as the onset of amorphization takes place at high laser pulse fluence. This technique offers a simple, yet efficient and attractive approach to produce highly uniform and high aspect ratio silicon nanostructures in the 200–300 nm range.

Direct And Subdiffraction-Limit Laser Nanofabrication In Silicon

Subdiffraction 3D Nanolithography by Two‐Photon Two‐Step Absorption and Photoinhibition

High Throughput Laser Nano Direct Writing Technique

Sub-diffraction Optical Beam Lithography Based on a Center-Non-zero Depletion Laser

Laser nanofabrication inside silicon with spatial beam modulation and anisotropic seeding

Microfabrication Assisted by Laser-Trapped Microparticle Tools

Laser nano-fabrication inside silicon with spatial beam modulation and non-local seeding

Direct Laser Writing Breaking Diffraction Barrier Based on Two-Focus Parallel Peripheral-Photoinhibition Lithography

Surface Nano-fabrication by Laser Precision Engineering

Super-regular femtosecond laser nanolithography based on dual-interface plasmons coupling

Study for Laser Controlled Fabrication of Micro/Nano-Structures of Silicon Based on Multi-Physics Model

Fabrication of highly homogeneous and controllable nanogratings on silicon via chemical etching-assisted femtosecond laser modification

Highly uniform silicon nanopatterning with deep-ultraviolet femtosecond pulses

Realising high aspect ratio 10 nm feature size in laser materials processing in air at 800 nm wavelength in the far-field by creating a high purity longitudinal light field at focus

Beyond the "coffee ring": re-entrant ordering in an evaporation-driven self-assembly in a colloidal suspension on a substrate.

Remote and Rapid Micromachining of Broadband Low-Reflectivity Black Silicon Surfaces by Femtosecond Laser Filaments.

Controllable fabrication of Sub-20nm structures with coupling field tip enhancement effect induced by nanosecond pulsed laser irradiation

Sub-wavelength Ripple Formation on Silicon Induced by Femtosecond Laser Radiation

Controllable Fabrication of Super-Resolution Nanocrater Arrays by Laser Direct Writing.

Laser Nanofabrication: Applications in Micro-Optics, Micro-Electronics, Micromachines, and Microfluidics

Superlens-enhanced Laser Interference Lithography