Gate-Defined Quantum-Dot Devices Realized In Ingaas/Inp By Incorporating A Hfo2 Layer As Gate Dielectric

jie sun,marcus larsson,ivan maximov,h hardtdegen,hongqi xu
DOI: https://doi.org/10.1063/1.3077188
IF: 4
2009-01-01
Applied Physics Letters
Abstract:Gate-defined quantum dots in an InGaAs/InP heterostructure are realized by incorporating a high-kappa HfO2 material as a gate dielectric using atomic layer deposition. The fabricated quantum-dot devices show Coulomb blockade effect at low temperature. The Coulomb blockade current peaks are found to shift in pairs with the magnetic field applied perpendicular to the quantum-dot plane, due to the filling of electrons into spin-degenerate orbital states. When the magnetic field is applied parallel to the quantum-dot plane, spin splittings of orbital states are observed and the extracted effective g-factors are found to be different for different orbital states.
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