Fine Line Structures of Ceramic Films Formed by Patterning of Metalorganic Precursors Using Photolithography and Ion Beams

LS HUNG,LR ZHENG
DOI: https://doi.org/10.1063/1.107058
IF: 4
1992-01-01
Applied Physics Letters
Abstract:Fine line structures of ceramic thin films were fabricated by patterning of metalorganic precursors using photolithography and ion beams. A trilevel structure was developed with an outer resist layer to transfer patterns, a silver delineated layer as an implantation mask, and a planar resist layer protecting the precursor film from chemical attacking and sputtering. Ion irradiation through the Ag stencil rendered metal carboxylates insoluble in 2-ethylhexanoic acid, permitting patterning of the precursor film with patterning features on micron scales. The potential of this technique was demonstrated in patterning of Bi2Sr2CaCu2O8+x and Pb(Zr0.53Ti0.47) thin films.
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