Tuning Of The Metal-Insulator Transition In Electrolyte-Gated Ndnio3 Thin Films

shutaro asanuma,p h xiang,hiroshi yamada,h sato,i h inoue,hiroshi akoh,anna g u sawa,kouki ueno,hidekazu shimotani,hongtao yuan,m kawasaki,yoshihiro iwasa
DOI: https://doi.org/10.1063/1.3496458
IF: 4
2010-01-01
Applied Physics Letters
Abstract:We demonstrate electrostatic control of the metal-insulator transition in the typical correlated-electron material NdNiO3 through a large effective capacitance of the electric double layer at the electrolyte/NdNiO3 interface. The metal-insulator transition temperature (T-MI) of NdNiO3 is shown to decrease drastically with increasing hole concentration through the application of a negative gate voltage (V-G). The shift in T-MI (vertical bar Delta T-MI vertical bar) is larger for thinner NdNiO3; for VG of -2.5 V, vertical bar T-MI vertical bar of 5-nm-thick NdNiO3 is as large as 40 K, and the resistivity change near 95 K is one order of magnitude. This study may be potentially applicable to Mott transistor devices. (C) 2010 American Institute of Physics. [doi:10.1063/1.3496458]
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