Light Tuning of the Resistance of NdNiO3 Films with CoFe2O4 Capping

Muhammad Shahrukh Saleem,Cheng Song,Fan Li,Youdi Gu,Xianzhe Chen,Guoyi Shi,Qi Li,Xiaofeng Zhou,Feng Pan
DOI: https://doi.org/10.1002/pssr.201800186
2018-01-01
Abstract:Metal-insulator transition (MIT) is generally thought to be difficult to alter once the material has been prepared. In this study, visible light is used to tune the resistance of NdNiO3 films, which are covered by granular CoFe2O4 capping, in an insulating state. With light illumination, the resistance of the NdNiO3 films is enhanced significantly at a low temperature of approximate to 9K, which shows non-volatile behavior. The magnitude of light-induced resistance increase is dependent on the light wavelength and illumination time, irrespective of whether the time is consecutive or intermittent. Light control of the resistance can be ascribed to photon-induced release of the monoclinic lattice of NdNiO3, which is clamped by granular CoFe2O4 capping before the light illumination. Our finding provides insight into the optical manipulation of physical properties on an interface and applications of this method in optoelectronics.
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