Ni2Si Nanowires of Extraordinarily Low Resistivity

Z. Zhang,J. Lu,P.-E. Hellstrom,M. Ostling,S.-L. Zhang
DOI: https://doi.org/10.1063/1.2207222
IF: 4
2006-01-01
Applied Physics Letters
Abstract:Ultralong, polycrystalline Ni2Si nanowires are fabricated by combining sidewall transfer lithography with self-aligned silicidation. Upon formation at 500°C, the nanowires that are 400μm long with a rectangular cross section of 37.5 by 25.3nm are characterized by a resistivity of 25±1μΩcm which is similar to the value for Ni2Si thin films. Further annealing at 800°C results in an extraordinarily low wire resistivity of 10μΩcm. Such a drastic decrease in resistivity is attributed to a significant grain growth and a low density of defects in the nanowires.
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