Introduction of F-4-Tcnq/Moo3 Layers for Thermoelectric Devices Based on Pentacene

Wu Shuang-Hong,Ryosuke Nakamichi,Masatsugu Taneda,Zhang Qi-Sheng,Chihaya Adachi
DOI: https://doi.org/10.1088/1674-1056/23/9/098502
2014-01-01
Chinese Physics B
Abstract:We introduced a dual electron accepting layer composed of tetrafluoro-tetracyanoquinodimethane (F-4-TCNQ) and MoO3 for thermoelectric devices based on a pentacene layer. We found that the power factor is enhanced by placing an F-4-TCNQ layer directly in contact with the pentacene layer and it is also enhanced by placing a MoO3 layer between the F-4-TCNQ layer and the Au electrode. By examining the contact resistance using a field effect transistor and a hole-only diode, we confirmed that the hole injection is improved due to the reduction of contact resistance at the interface between the MoO3 layer and the Au electrode.
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