Effect of the Sn dopant on the crystallization of amorphous Ge 2 Sb 2 Te 5 films induced by an excimer laser

n bai,f r liu,x x han,zhijun zhu,xueyin lin,n x sun
DOI: https://doi.org/10.1016/j.optlastec.2015.03.019
IF: 4.939
2015-01-01
Optics & Laser Technology
Abstract:In this paper, the influence of Sn doping (0%, 8%, and 14%) on the crystallization of Ge2Sb2Te5 (GST) was studied with the aid of an ultraviolet laser. It was found that the addition of Sn element not only expanded the lattice parameter but also decreased the crystallization temperature and activation energy as compared to the GST. As compared to the Ge2Sb2Te5, a more complete crystallization of the Sn doping Ge2Sb2Te5 is mainly due to the lower binding energy of Sn–Te (359.8kJ/mol), which could be more easily taken part in the bond breakage and formation than Ge–Te (456kJ/mol) in such a short time as 30ns. The equiaxial grains were obtained for the Sn8Ge15Sb23Te54 films when crystallization was induced by the laser fluence of 20mJ/cm2 but the grains elongated when the laser fluence was increased to 60mJ/cm2. The reason may be the incorporation of Sn elements changed the crystal nucleation mode.
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