Abstract:The overall aim of this work is to produce a parallel e-beam lithography system using an array of field-emitting microguns independently driven by an active matrix array. This paper will describe the work carried out on optimisation of suitable carbon-based materials for use as the electron emitter source in such a system. From initial experiments on field emission from tetrahedrally bonded amorphous carbon (ta-C) and nanocluster carbon films, it has been deduced that emission occurs from nanometre-size sp(2) sites within an insulating sp(3) matrix. Hence, we have carried out a series of experiments to investigate the possibility of deliberately producing such sp(2) regions within a predominantly sp(3) matrix using e-beam irradiation, high energy ion beam irradiation and post deposition plasma processing of ta-C. Unfortunately, although the use of I GeV uranium ions successfully produced arrays of sp(2) rich regions on the required nanometre scale, no preferential field emission from such sites could be obtained. The final series of experiments were thence carried out using aligned carbon nanotubes (CNTs) as the electron sources. Results on aligned CNTs, grown using a dc plasma technique and a Ni catalyst, are presented. Both the diameter and length of the CNTs are dependent upon the thickness of the catalytic layer used. Field emission from an array of CNTs was obtained.

Nanoscale Electron Field Emissions from the Bare, Hydrogenated, and Graphitelike-Layer-Covered Tetrahedral Amorphous Carbon Films

Field emission from a new form of thin film amorphous carbon having nanoparticle inclusions and carbon nanotubes

Field Emission from As Grown and Nitrogen Incorporated Tetrahedral Amorphous Carbon/Silicon Heterojunctions Grown Using A Pulsed Filtered Cathodic Vacuum Arc Technique

Electron Field Emission Studies from Amorphous Carbon Thin Films

A Field Emission Study of the Critical Parameters of Amorphous Carbon Films Deposited on a Variety of Carbonaceous Substrates

Field emission properties from aligned carbon nanotube films with tetrahedral amorphous carbon coatings

Field emission from Nanocomposite Carbon

Field Electron Emission from Carbon Containing Thin Films

Field Emission Properties of Nanocomposite Carbon Nitride Films

Self-texturing of nitrogenated amorphous carbon thin films for electron field emission

Field Emission from Dense, Sparse, and Patterned Arrays of Carbon Nanofibers

Enhanced Field Electron Emission from Nitrogen Doped Tetrahedral Amorphous Carbon Film

The Performance of Thin Film Carbon Materials and Carbon Nanotubes As Cold Cathodes

Field Emission From Short And Stubby Vertically Aligned Carbon Nanotubes

Field Emission of Graphene and Carbon Nanotubes

Field Electron Emission From Individual Carbon Nanotubes Of A Vertically Aligned Array

Carbon films for use as the electron source in a parallel e-beam lithography system

Modeling of the Electron Field Emission Process in Polycrystalline Diamond and Diamond-Like Carbon Thin Films

Low Field-Induced Electron Emission Phenomenon Observed from the Carbon Containing Thin Films

Cross-Sectional Structure Of Tetrahedral Amorphous Carbon Thin Films

Influence of the Heterojunction on the Field Emission from Tetrahedral Amorphous Carbon on Si