Mn Behavior In Ge0.96mn0.04 Magnetic Thin Films Grown On Si

wang yong,zou jin,zhao zuoming,han xinhai,zhou xiaoyu,k l wang
DOI: https://doi.org/10.1063/1.2875110
IF: 2.877
2008-01-01
Journal of Applied Physics
Abstract:Mn behaviors in the Ge0.96Mn0.04 thin films grown on Si (001) substrates by molecular beam epitaxy were investigated by high resolution transmission electron microscopy, electron energy loss spectroscopy, and energy dispersive spectroscopy. Unlike the previously reported case of GeMn thin films grown on Ge, Mn has been found to be diffused toward to the surface during the thin film growth. When the Mn concentration is sufficiently high, Mn5Ge3 clusters may be formed. Further annealing of the high Mn concentrated thin film promotes the formation of alpha-Mn metallic clusters. We believe that all these extraordinary phenomena are attributed to Si as the substrate. (c) 2008 American Institute of Physics.
What problem does this paper attempt to address?