Structure of Mnxge1-X Dilute Magnetic Semiconductor Films

Sun Yu,Sun Zhi-Hu,Zhu San-Yuan,Shi Tong-Fei,Ye Jian,Pan Zhi-Yun,Liu Wen-Han,Wei Shi-Qiang
DOI: https://doi.org/10.7498/aps.56.5471
IF: 0.906
2007-01-01
Acta Physica Sinica
Abstract:The structure of Mn-x Ge1-x dilute magnetic semiconductor thin films prepared by magnetron co-sputtering has been studied by X-ray diffraction (XRD) and X-ray absorption fine structure (XAFS) techniques. The XRD results show that in the Mn-x Ge1-x thin film with low Mn doping concentration (x = 0.070) only diffraction peaks attributed to crystalline Ge can be observed. In samples with high Mn doping concentrations ( x = 0.250, 0.360), the secondary phase Ge-3 Mn-5 appears, and its content enhances with Mn doping concentration. The XAFS results indicate that for the Mn-0.07 Ge-0.93 thin film, Mn atoms are mainly incorporated into the Ge lattice and located at the substitutional sites of Ge atoms with the ratio of 75%, while for the Mn-0.25 Ge-0.75 and Mn-0.36 Ge-0.64 samples, most of the Mn atoms are aggregated to form Ge-3 Mn-5.
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