Study on Laser Micro Shock Effect on Electrical Resistivity of Nanometer Copper Film

qing xue,yin qun hua,yu chuan bai,rui fang chen,hai xia liu
DOI: https://doi.org/10.4028/www.scientific.net/AMR.989-994.45
2014-01-01
Abstract:The aim of this research is to improve the electrical performance of the nanometer copper film by laser micro shock processing. The nanometer copper film was prepared by the magnetron sputtering. The mechanism of laser micro shock processing effect on electrical resistivity, hardness and elastic modulus was investigated. The results show that the electrical resistivity of copper film after laser micro shock reduced by 22.5 % on average. And, the hardness and the elastic modulus increased by 38.5 % and 45.2 % on average, respectively. According to our research, we conclude that, the existence of a large number of twin, twin boundary, fault and the grow up grain are the main factor of the improvement of the electrical performance; and the existence of twin, stress concentration holes and fault are the key to improve its mechanical properties.
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