Exploring the influence of the contact resistance on perovskite phototransistors

Lijian Chen,Quanhua Chen,Hong Zhu,Runfeng Wang,Yiping Wu,Run Li,Li Zhu,Guangan Yang,Xiang Wan,Xing Zhao,Zhihao Yu,Binhong Li,Chee Leong Tan,Huabin Sun,Yong Xu
DOI: https://doi.org/10.1063/5.0190100
IF: 4
2024-04-15
Applied Physics Letters
Abstract:Organic–inorganic hybrid perovskites are widely used in photodetection owing to their high optical absorption coefficients. A variety of research has been conducted on perovskite phototransistors and their optoelectronic properties, but the exploration of the influence of contact resistance remains limited. In this work, we employed the transmission-line method to separate the contact resistance Rc × W (ranging from 4.81 × 104 to 4.77 × 103 Ω cm) and the channel resistance Rch × W (ranging from 1.93 × 104 to 1.16 × 104 Ω cm) of (PEA)2SnI4 perovskite phototransistors at different light intensities (520 nm, ranging from 0 to 2550 μW/cm2). Further analysis reveals that illumination-induced accumulation of charge carriers at the metal/semiconductor interface reduces the Schottky barrier. Approximately 90% of the observed increase in photocurrent can be attributed to the reduction in the contact resistance. Our finding underscores the crucial role of charge injection in influencing perovskite-based phototransistors.
physics, applied
What problem does this paper attempt to address?