Fabrication of silicon nanowire arrays by macroscopic galvanic cell-driven metal catalyzed electroless etching in aerated HF solution.

Lin Liu,Kui-Qing Peng,Ya Hu,Xiao-Ling Wu,Shuit-Tong Lee
DOI: https://doi.org/10.1002/adma.201304327
IF: 29.4
2014-01-01
Advanced Materials
Abstract:Macroscopic galvanic cell-driven metal catalyzed electroless etching (MCEE) of silicon in aqueous hydrofluoric acid (HF) solution is devised to fabricate silicon nanowire (SiNW) arrays with dissolved oxygen acting as the one and only oxidizing agent. The key aspect of this strategy is the use of a graphite or other noble metal electrode that is electrically coupled with silicon substrate.
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