Barrier inhomogeneities at vertically stacked graphene-based heterostructures.

Yen-Fu Lin,Wenwu Li,Song-Lin Li,Yong Xu,Alex Aparecido-Ferreira,Katsuyoshi Komatsu,Huabin Sun,Shu Nakaharai,Kazuhito Tsukagoshi
DOI: https://doi.org/10.1039/c3nr03677d
IF: 6.7
2014-01-01
Nanoscale
Abstract:The integration of graphene and other atomically flat, two-dimensional materials has attracted much interest and been materialized very recently. An in-depth understanding of transport mechanisms in such heterostructures is essential. In this study, vertically stacked graphene-based heterostructure transistors were manufactured to elucidate the mechanism of electron injection at the interface. The temperature dependence of the electrical characteristics was investigated from 300 to 90 K. In a careful analysis of current-voltage characteristics, an unusual decrease in the effective Schottky barrier height and increase in the ideality factor were observed with decreasing temperature. A model of thermionic emission with a Gaussian distribution of barriers was able to precisely interpret the conduction mechanism. Furthermore, mapping of the effective Schottky barrier height is unmasked as a function of temperature and gate voltage. The results offer significant insight for the development of future layer-integration technology based on graphene-based heterostructures.
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