Electric field modulation of Schottky barrier height in graphene/MoSe2 van der Waals heterointerface

Yohta Sata,Rai Moriya,Sei Morikawa,Naoto Yabuki,Satoru Masubuchi,Tomoki Machida
DOI: https://doi.org/10.1063/1.4926973
2015-07-18
Abstract:We demonstrate a vertical field-effect transistor based on a graphene/MoSe2 van der Waals (vdW) heterostructure. The vdW interface between the graphene and MoSe2 exhibits a Schottky barrier with an ideality factor of around 1.3, suggesting a high-quality interface. Owing to the low density of states in graphene, the position of the Fermi level in the graphene can be strongly modulated by an external electric field. Therefore, the Schottky barrier height at the graphene/MoSe2 vdW interface is also modulated. We demonstrate a large current ON-OFF ratio of 10^5. These results point to the potential high performance of the graphene/MoSe2 vdW heterostructure for electronics applications.
Mesoscale and Nanoscale Physics
What problem does this paper attempt to address?
The problem that this paper attempts to solve is to achieve high - performance vertical field - effect transistors (VFETs) by modulating the Schottky barrier height through an electric field in the graphene/MoSe2 van der Waals heterojunction interface. Specifically, the researchers focus on how to use an external electric field to adjust the Schottky barrier height at the graphene/MoSe2 interface, thereby effectively controlling the current on - off ratio of the device and achieving high - electron performance. The paper shows that by changing the thickness of the MoSe2 layer, the height of the Schottky barrier and its modulation effect can be significantly affected, which in turn affects the performance of the VFET, especially its current on - off ratio (ON - OFF ratio). The key to the research lies in understanding the influence of different thicknesses of MoSe2 on the Schottky barrier height and how this influence can be modulated by an external electric field. The experimental results show that when the number of MoSe2 layers is 44, the device exhibits the best performance, with a current on - off ratio as high as \(10^5\) and an on - state current density exceeding \(10^3\) A/cm\(^2\). These results are of great significance for the development of high - performance electronic devices based on graphene/transition - metal chalcogenide (TMD) heterostructures.