Engineering Schottky Barrier in Vertical Graphene/inn Heterostructure

Yuhang Liu,Hong Li,Fengbin Liu,Shuai Sun,Gang Zhou,Tao Qing,Shaohua Zhang,Jing Lu
DOI: https://doi.org/10.1016/j.ssc.2022.114770
IF: 1.934
2022-01-01
Solid State Communications
Abstract:In recent years, van der Waals stacked heterostructures (vdWHs) have gained much study interest for enhancing nanoelectronics' performance. We take the first-principles methods to study the interface contact characters of the graphene/InN vdWH under the interlayer coupling and electric field. The natural electronic characters of both the graphene and InN components keep intact at the equilibrium interlayer distance with an n-type Schottky contact. Impressively, it tunes to Ohmic contact when the interlayer distance increases to 4.73 angstrom or the applying negative electric field increases to-0.42 V/angstrom, while it converts to p-type Schottky contact under a positive electric field greater than 0.2 V/angstrom. These findings are of great significance for the application of graphene/InN vdWH in high-performance nanoelectronics.
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