Controllable Schottky Barriers and Contact Types of BN Intercalation Layer in Graphene/MoSi2As4 vdW Heterostructures via Applying External Electrical Field
Yuan Guo,Yujing Dong,Xiaolin Cai,Liangliang Liu,Yu Jia,yujing dong,Xiao-Lin Cai
DOI: https://doi.org/10.1039/d2cp02011d
IF: 3.3
2022-07-16
Physical Chemistry Chemical Physics
Abstract:Graphene-based van der Waals (vdW) heterostructures have opened unprecedented opportunities for various device applications due to their rich functionalities and novel physical properties. Motivated by the successful synthesis of MoSi2N4 monolayer (Science, 2020, 369, 670), in this work by means of first-principles calculations we construct and investigate the interfacial electronic properties of Graphene/MoSi2As4 vdW heterostructure, which is expected to be energetically favorable and stable. Our results show that the Graphene/MoSi2As4 heterostructure forms an n-type Schottky contact with a low barrier of 0.12 eV, which is sensitive to the external electric field and the transformation from an n-type Schottky contact to a p-type one can be achieved at 0.2 V/Å. The small effective masses and strong optical absorption intensity indicate that the Graphene/MoSi2As4 heterostructure will have high carrier mobility and can be applied to high-speed FET. Importantly, we also show that the opening band gap can be achieved in the Graphene/BN/MoSi2As4 heterostructure and the type-I band alignment can transform into the type-II under an external electric field of -0.2 V/Å. These findings demonstrate that the Graphene/MoSi2As4 heterostructure can be considered as promising candidate for high-efficiency Schottky nanodevices.
chemistry, physical,physics, atomic, molecular & chemical