Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures.

Yiyu Ou,Valdas Jokubavicius,Rositza Yakimova,Mikael Syväjärvi,Haiyan Ou
DOI: https://doi.org/10.1364/OL.37.003816
IF: 3.6
2012-01-01
Optics Letters
Abstract:In the present work, an approach of fabricating pseudoperiodic antireflective subwavelength structures (ARS) on fluorescent SiC by using self-assembled etch mask is demonstrated. By applying the pseudoperiodic (ARS), the average surface reflectance at 6 degrees incidence over the spectral range of 390-785 nm is dramatically suppressed from 20.5% to 1.62%, and the hydrophobic surface with a large contact angle of 98 degrees is also achieved. The angle-resolved photoluminescence study presents a considerable omnidirectional luminescence enhancement with an integral intensity enhancement of 66.3% and a fairly preserved spatial emission pattern. (C) 2012 Optical Society of America
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