Abstract:Fused silica optics, as key components in high - power laser systems, are prone to be damaged under short - pulse ultraviolet (UV) laser irradiation. CO 2 laser is usually used to repair the laser damage and extend the service life of optics. However, the anti - laser damage characteristics of repaired substrates sometimes can't meet the expectation. To facilitate better application of CO 2 laser repairing method, this work studied the CO 2 laser irradiating mechanism of fused silica in detail and investigated the damage characteristics of repaired optical surface through experiments. Firstly, finite element level - set (FELS) method is adopted to simulate CO 2 laser irradiating process. The simulation showed that CO 2 laser irradiation would cause molten material migration, vapor material deposition and affect the formation of residual stress. Various tests of morphology, residual stress, and photo - thermal absorption were conducted to study the changes of laser damage characteristics of repaired craters. The experimental results presented that molten materials migration and vapor materials re deposition occurred in CO 2 laser irradiation, which would promote the formation of residual stress, cause stronger laser absorption, or even induce laser damage. Through the experiment, accuracy of simulation was verified further. In this work, the CO 2 laser repairing mechanism of fused silica and laser damage characteristics of repaired optics are clarified through FELS simulation and experiments. Relative results can provide a certain technical support for the performance improvement of repaired fused silica optics.

Ultraviolet Laser-Induced Damage on Fused Silica Substrate and Its Sol-Gel Coating.

Laser-Induced Damage on Ordered and Amorphous Sol-Gel Silica Coatings

Laser Induced Damage Characteristics of Fused Silica Optics Treated by Wet Chemical Processes

Improving Uv Laser Damage Threshold Of Fused Silica Optics By Wet Chemical Etching Technique

Laser-induced damage mechanism of the sol–gel single-layer SiO2 acid and base thin films

Laser Induced Damage in Fused Silica for 248 nm

Preparation of Transmissive Optics Coated by Sol-gel Method With High Laser-induced Damage Threshold

Laser-induced Damage of Sol-Gel Silica Acid and Basic Thin Films

Increased Laser-Damage Resistance of Sol–Gel Silica Coating by Structure Modification

Influence of Subsurface Defects on 355 Nm Laser Damage Resistance of Monolayer and Multilayer Coatings

The Infrared Spectra and Laser Damage Threshold of the Fused Silica after Megacoustic Field Assisted Hydrofluoric-Based Etching

Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics

Material migration and damage characteristics of fused silica optical surface treated by CO 2 laser/short – pulse ultraviolet laser

Damage Behaviors of Silica Microparticles on Fused Silica Optics under 355 Nm High Fluence Laser

Effect of UV Laser Conditioning on Fused Silica in Vacuum

Enhancement of laser induced damage threshold of fused silica by acid etching combined with UV laser conditioning

Study of UV Repetition Laser-Induced Absorption on Fused Silica Surface Using a Surface Thermal Lensing Technique.

Evolution of Oxygen Deficiency Center on Fused Silica Surface Irradiated by Ultraviolet Laser and Posttreatment

Ab Initio Molecular Dynamics Simulation of the Effect of Impurities on Laser-Induced Damage of Fused Silica

Laser Damage Induced by Contamination Particles on Coated Optical Components

Surface Evolution and Laser Damage Resistance of CO2 Laser Irradiated Area of Fused Silica