Abstract:SiO2 sol-gel antireflection film coated on fused silica can reduce the reflection loss and improve the transmittance of the optical component, although it is still prone to laser induced damage. Laser conditioning is an effective way to improve the laser induced damage threshold (LIDT) of SiO2 sol-gel antireflection film. In this paper, single-layer SiO2 sol-gel antireflection films pretreated by triple-frequency laser with different parameters are characterized by the macroscopical parameters, such as transmittance, refractive index, and thickness. The law of surface modification and the defect removal mechanism of the SiO2 sol-gel antireflection film by laser conditioning are obtained. It is found that laser conditioning can reduce the thickness of the film and introduce densification. In addition, laser conditioning can eliminate micro-defects, such as vacancies and voids in the preparation of SiO2 sol-gel antireflection films, which is the main reason to improve the laser damage resistance of films. Finally, the laser conditioning process with three step laser energy combinations of (0.2–0.6–1.0) Fth0 (zero damage threshold) is the best one to obtain high transmittance, and excellent effects on structure modification and defect removal of films. The research in this paper provides data support for the engineering application and mechanism research of laser conditioning.

Effect of UV Laser Conditioning on Fused Silica in Vacuum

Enhancement of laser induced damage threshold of fused silica by acid etching combined with UV laser conditioning

Effects of Vacuum on Fused Silica UV Damage

The damage mechanisms of fused silica irradiated by 355nm laser in vacuum

Experiment studies on effect of ultraviolet laser conditioning on silica surface damage

Growth of Laser Initial Damage in Conditioned Fused Silica at 355 Nm

Effects of Pre-Conditioning on 355 Nm Laser-Induced Damage Growth of Fused Silica

Laser Induced Damage Characteristics of Fused Silica Optics Treated by Wet Chemical Processes

Improving Uv Laser Damage Threshold Of Fused Silica Optics By Wet Chemical Etching Technique

Laser Induced Damage in Fused Silica for 248 nm

Evolution of Oxygen Deficiency Center on Fused Silica Surface Irradiated by Ultraviolet Laser and Posttreatment

Ultraviolet Laser-Induced Damage on Fused Silica Substrate and Its Sol-Gel Coating.

Laser-induced defects in fused silica by UV laser irradiation

Recovery of fused silica surface damage resistance by ion beam etching

Effect of Laser Conditioning on Surface Modification and Laser Damage Resistance of SiO2 Antireflection Film

Experimental Study on 800 Nm Femtosecond Laser Ablation of Fused Silica in Air and Vacuum

Effect of Gas Atmosphere and Pressure on 351 Nm Laser-Induced Damage Threshold of Fused Silica

Damage Induced 0n Fused Silica by Fundamental Frequency and Third Harmonic of Nd:YAG Laser

Characterization of 355 Nm Laser-Induced Damage of Mitigated Damage Sites in Fused Silica

Bulk Damage and Stress Behavior of Fused Silica Irradiated by Nanosecond Laser

Evolution of Intrinsic Defects and Ring Structures on the Surface of Fused Silica Optics after CO2 Laser Conditioning.