Ultra-low-loss High-Aspect-ratio Si3N4 Waveguides.

Jared F. Bauters,Martijn J. R. Heck,Demis John,Daoxin Dai,Ming-Chun Tien,Jonathon S. Barton,Arne Leinse,Rene G. Heideman,Daniel J. Blumenthal,John E. Bowers
DOI: https://doi.org/10.1364/oe.19.003163
IF: 3.8
2011-01-01
Optics Express
Abstract:We characterize an approach to make ultra-low-loss waveguides using stable and reproducible stoichiometric Si3N4 deposited with low-pressure chemical vapor deposition. Using a high-aspect-ratio core geometry, record low losses of 8-9 dB/m for a 0.5 mm bend radius down to 3 dB/m for a 2 mm bend radius are measured with ring resonator and optical frequency domain reflectometry techniques. From a waveguide loss model that agrees well with experimental results, we project that 0.1 dB/m total propagation loss is achievable at a 7 mm bend radius with this approach.
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