Abstract:Even though the decomposition of disilane on silicon surfaces has been extensively studied, the molecular mechanism for its decomposition has not been fully resolved. The general view motivated partly by spectroscopic data is that decomposition occurs through silicon-silicon bond dissociation although there is evidence from kinetics that silicon-hydrogen bond dissociation is important, and perhaps even dominant. Thus, we reexamine the assignment of the experimental vibrational peaks observed in disilane and silane adsorption in order to assess the evidence for the silicon hydride species that are formed during decomposition. We calculate the vibrational density of states for a number of silicon hydride species on the Si(100)-(2x1) surface using Car-Parrinello molecular dynamics. We obtain the calculated vibrational frequency in the adiabatic limit by extrapolating to zero orbital mass, calibrating our method using the well-established monohydride peak. The calculated vibrational frequencies of the monohydride are in good agreement experimental data. Our results show that the spectroscopic data for silicon hydrides does not preclude the occurrence of Si(2)H(5) on the surface thus providing evidence for silicon-hydrogen bond dissociation during disilane adsorption. Specifically, we find that an experimentally observed vibrational peak at 2150 cm(-1) that has generally been attributed to the trihydride SiH(3) is more likely to be due to Si(2)H(5). Our results also clear up the assignment of two peaks for monohydride species adsorbed at the edge of a growing terrace, and a peak for the dihydride species adsorbed in the interdimer configuration.

Desorption of H from Si(111) by Resonant Excitation of the Si-H Vibrational Stretch Mode.

A study of plasma-deposited amorphous SiOx:H (0⩽x⩽2.0) films using infrared spectroscopy

Kinetics of Molecular Hydrogen Dissociative Adsorption on Si(111) Studied by Sum-Frequency Vibrational Spectroscopy and Second Harmonic Generation

A direct pathway for sticking/desorption of H$_2$ on Si(100)

THE THERMAL DESORPTION SPECTRA STUDY OF HYDROGEN CHEMISORPTION ON Si(100) CLEAN SURFACE

Dynamical, Vibrational, Electronic and Optical Properties in c-Si:H with Bond-Centered-Hydrogen, H Dimers and Other H Complexes

Stability of the Si–H Bond on the Hydrogen-Terminated Si(1 1 1) Surface Studied by Sum Frequency Generation

Initial Processes of Hydrogen Chemisorption on Si(111) Surface

Thermal desorption study of deuterium on Si(100) surface

Characterization of Hydrogen-Terminated Si(111) Surfaces by Sum-Frequency Surface Vibrational Spectroscopy

Revisiting the vibrational spectra of silicon hydrides on Si(100)-(2x1) surface: What is on the surface when disilane dissociates?

State-selective spectroscopic detection of reaction products (SiH2, Si) in the IR laser decomposition of SiH4

Thermally stimulated H emission and diffusion in hydrogenated amorphous silicon

Tip-Induced $β$-Hydrogen Dissociation in an Alkyl Group Bound on Si(001)

New Hydrogen Desorption Kinetics from Vicinal Si(001) Surfaces Observed by Reflectance Anisotropy Spectroscopy

Resonant Raman Scattering in Hydrogenated Amorphous Silicon Films

Velocity and Stability of Condensed Polymorphic SiH4: A High-Temperature High-Pressure Brillouin Investigation*

Silane Photoabsorption Spectra Near the Si 2p Thresholds: the Geometry of Si 2p Excited SiH 4 **

Resonant Photoemission from Si(001)

Electron Dynamics of Silicon Surface States: Second-Harmonic Hole Burning on Si(111)-(7 X 7).

Adsorbate Lone-Pair-electron Stimulated Charge Transfer Between Surface Dangling Bonds: Methanol Chemisorption on Si(1 1 1)-7 × 7