Retention Model for High-Density ReRAM

z wei,tsuyoshi takagi,yoshihiko kanzawa,y katoh,tomoko ninomiya,kenji kawai,s muraoka,shinji mitani,kengo katayama,s fujii,ryoko miyanaga,yukio kawashima,takumi mikawa,koichi shimakawa,k aono
DOI: https://doi.org/10.1109/IMW.2012.6213638
2012-01-01
Abstract:A retention model for both the high resistance state and low resistance state of the bipolar ReRAM is developed. Degradation of resistance is caused by the oxygen vacancy profile in filament changing due to oxygen diffusion.
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