Electrical Characterization of 1mev Electron-Irradiated Ito/Inp Structures

JK LUO,H THOMAS,NM PEARSALL
DOI: https://doi.org/10.1109/iciprm.1992.235618
1992-01-01
Abstract:MOCVD (metal-organic chemical vapor deposited) InP diodes showed a small carrier removal rate and subsequently were more resistive to radiation than LEC substrates. 1 MeV electron irradiation induced five hole traps and six electron traps with densities of 10/sup 14/ approximately 3*10/sup 15/ cm/sup -3/. Defects H3, H4 and E2 are found not to be the most important cause of cell degradation, but some unknown defects. The threshold annealing temperatures were found to be approximately 85 degrees C for defects H7, E8, and E9, approximately 100 degrees C for H3 and H4, and >160 degrees C for E2, E3, and E4. The injection annealing of H4 was confirmed in ITO (indium tin oxide)/InP structures with an activation energy of 0.27 eV.<>
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