GeO x and SiO x nanowires grown via the active oxidation of Ge and Si substrates

Avi Shalav,Gabriel H. Collin,Yi Yang,Taehyun Kim,Robert G. Elliman
DOI: https://doi.org/10.1557/jmr.2011.150
IF: 2.7
2011-01-01
Journal of Materials Research
Abstract:In this study, we show that the volatile monoxide species generated during the active oxidation of Ge and Si substrates can be utilized in the presence of Au catalytic nanoparticles to nucleate and grow GeO x and SiO x nanowires. A simple thermodynamic model is developed to ascertain the critical O 2 partial pressure as a function of temperature required for the active oxidation of Ge and Si substrates and is experimentally verified. The ideal conditions for uniform nanowire growth across the substrate are shown to be primarily dependent on the O 2 partial pressure, the annealing temperature and thicknesses of the surface oxide, and deposited Au. The role of a metastable surface oxide separating the active oxidation and NW nucleation processes is also discussed.
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