One-step deposition of photocatalytically active TiO 2 films via wire-to-plate dielectric barrier discharge plasma at atmospheric pressure

Lanbo Di,Xiaosong Li,Aimin Zhu

2011-01-01

Abstract:TiO 2 films play an important role in various applications, e.g., photocatalysis, photovoltaics, and biocompatibility. A wire-to-plate dielectric barrier discharge (DBD) induced plasma CVD device was used to fabricate photocatalytically active TiO 2 films on moving glass or plastic substrates at 1 atm. The discharge gap had an adjustable distance of 0.3-0.6 mm. The photocatalytic reaction test for TiO 2 films was performed by complete oxidation of HCHO in simulated air with a continuous flow reactor. The as-deposited TiO 2 films on cover glass or plastic substrates exhibited high photocatalytic activity. The apparent rate constants of the TiO 2 films on cover glass and plastic substrates were 0.99 and 0.52/sec, respectively. The influence of input power, discharge gap, and the partial pressure of TiCl 4 on the photocatalytic activity of the as-deposited TiO 2 films were also investigated. This is an abstract of a paper presented at the 2011 AIChE Spring Meeting & 7th Global Congress on Process Safety (Chicago, IL 3/13-17/2011).