Ultrafast Spray of Tio<inf>2</inf> Self-Cleaning Films in Tubular Substrates

Lujie Zhang,Shuang Yu,Kaile Wang,Jue Zhang,Jing Fang
DOI: https://doi.org/10.1109/PLASMA.2017.8496201
2017-01-01
Abstract:Currently, atmospheric pressure cold plasma has been proven to be an effective technique for preparing TiO <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> coating on planar substrates <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">1</sup> . However, few studies have focused on spraying TiO <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> on the interior of a tubular substrate. In this study, we developed an ultrafast process for spraying TiO <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> self -cleaning films inside tubular substrates using an atmospheric pressure air plasma jet generated by a dielectric barrier structu -re with hollow electrodes (HEDBS), and the total processing time was less than 20s. During the spraying process, using TiCl <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">4</inf> as precursor and air as working gas, the HEDBS plasma jet was inserted into a substrate tube and moved under control. The as-sprayed materials were characterized by various methods, such as SEM, Raman and XRD. Additionally, the self-cleaning properties of the prepared thin TiO <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> films were in -vestigated using oleic acid and n-heptane as target pollutants. Importantly, SEM images showed that the TiO <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> particles were dispersed evenly in the tubular substrates, and the spraying rate was estimated as 5 μm/s. Furthermore, Raman and XRD pattern indicated the anatase structure of the HEDBS-spayed TiO <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> coating after heating for 9 min. Further results of the self cleaning test suggested that the proposed cost- and timesaving HEDBS approach with air working gas could provide a feasible way for synthesizing thin TiO <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> nanofilms.
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